Electron Beam Lithography System
The JEOL JBX-A9 Series Electron Beam Lithography System is a state-of-the-art direct writing system designed for high precision and high throughput applications. Building upon JEOL’s advanced electron optics technology, the JBX-A9 offers exceptional stability and performance for semiconductor fabrication and nanofabrication processes.
Key Features:
Technical Specifications:
Basic Configuration:
Optional Features:
The JEOL JBX-A9 Series is a versatile and efficient electron beam lithography system, ideal for applications requiring high precision and throughput. Its advanced features and customizable options make it an asset for both research institutions and industrial manufacturers aiming to achieve cutting-edge results in nanofabrication and semiconductor device development.
For further information about its features, visit the official JEOL website.