JBX-8100FS Series

The JEOL JBX-8100FS Series is a state-of-the-art Electron Beam Lithography (EBL) system designed to meet the demanding requirements of high-throughput and high-precision applications in nanofabrication and semiconductor device production. Leveraging JEOL’s advanced electron optics technology, the JBX-8100FS offers exceptional stability and performance for both research and industrial purposes.

Key Features:

• Compact Design: The JBX-8100FS boasts a small footprint, with dimensions of 4.9 m (W) x 3.7 m (D) x 2.6 m (H), making it significantly more space-efficient compared to conventional systems.
• Low Power Consumption: Designed with energy efficiency in mind, the system operates at approximately 3 kVA, reducing power usage to one-third of that required by traditional EBL systems.
• High Throughput: Equipped with two exposure modes—high-resolution and high-throughput—the JBX-8100FS supports a variety of patterning needs, from ultra-fine processing to small to mid-size production. The system minimizes idle time during exposure and achieves a maximum scanning speed of 125 MHz, one of the highest levels globally, facilitating rapid and efficient writing processes.
• Modular and Upgradeable Platform: The system is available in two versions: G1 (entry model) and G2 (full-option model). Optional accessories can be added to the G1 model as needed, allowing for customization based on specific application requirements.
• Advanced Electron Optics: Incorporating JEOL’s renowned electron optics technology, the JBX-8100FS ensures ultimate stability during operation, contributing to consistent and reliable patterning results.
• Versatile Substrate Compatibility: The system accommodates substrates up to 200 mm in diameter, 6-inch mask blanks, and small samples of various sizes, catering to diverse fabrication needs.
• Enhanced Usability: The JBX-8100FS features a versatile Linux® operating system combined with a new graphical user interface, providing ease of operation. The data preparation program supports both Linux® and Windows®, enhancing flexibility for users.

Specifications

Optional Features:

• Optical Microscope: An optional in-situ optical microscope is available, enabling real-time observation and alignment during lithography processes.
• High-Voltage Program: A 25 kV high-voltage program is available as an option, offering additional operational flexibility.
• Data Preparation Program: Additional licenses for the data preparation program can be acquired to enhance data processing capabilities.
• High-Resolution Laser Beam Control System: An upgrade to a high-resolution laser beam control system is available, improving stage positioning resolution to 0.15 nm.

The JEOL JBX-8100FS Series is a versatile and efficient electron beam lithography system, ideal for applications requiring high precision and throughput. Its advanced features and customizable options make it a top choice for both research institutions and industrial manufacturers aiming to achieve cutting-edge results in nanofabrication and semiconductor device development.

For more detailed information about the JBX-8100FS Series, please visit the official JEOL website.