JBX-3200MVS

The JEOL JBX-3200MVS is a state-of-the-art variable-shaped electron beam lithography system engineered for mask fabrication targeting the 32 nm to 28 nm technology nodes. This advanced system leverages cutting-edge technology to deliver high-speed, high-precision, and highly reliable performance, making it an ideal choice for modern semiconductor manufacturing processes.

Key Features:

• Variable-Shaped Electron Beam: The system utilizes a 50 kV variable-shaped electron beam, allowing for flexible pattern generation essential for complex mask designs.
• Step-and-Repeat Specimen Stage: Incorporating a step-and-repeat writing method, the JBX-3200MVS enhances throughput and precision during the lithography process.
• Advanced Correction Functions: The system features writing-dose modulation and overlay-writing capabilities, enabling versatile corrections necessary for patterning legacy masks and reticles.
• High Throughput: An innovative Proximity Effect Correction (PEC) system enhances throughput by efficiently managing electron scattering effects, crucial for maintaining pattern fidelity at nanometer scales.
• High-Speed Data Transfer: Equipped with a high-speed data-transfer system, the JBX-3200MVS efficiently handles large volumes of data, supporting the intricate demands of advanced mask fabrication.

Specifications:

• Stitching Accuracy: ≤±3.5 nm
• Overlay Accuracy: ≤±5 nm

These specifications underscore the system’s capability to produce highly precise and reliable patterns, meeting the stringent requirements of modern semiconductor devices.

With a proven track record, JEOL’s JBX-3200MVS has been adopted by both captive and merchant mask shops globally, reflecting its reliability and performance in diverse production environments.

In summary, the JEOL JBX-3200MVS stands as a premier electron beam lithography system, offering unparalleled precision, speed, and adaptability for mask fabrication at the 32 nm to 28 nm nodes. Its advanced features and robust specifications make it an invaluable asset for semiconductor manufacturers aiming to achieve excellence in their lithography processes.

For more detailed information about the JBX-3200MVS and its applications, please visit the official JEOL website.