AXIS Supra+

Imaging X-Ray Photoelectron Spectrometer

Imaging X-Ray Photoelectron Spectrometer

Leading Surface Analysis

X-ray photoelectron spectroscopy (XPS) is unique in providing quantitative elemental and chemical state information from the uppermost 10 nm of a materials surface.  The AXIS Supra+ (also known as Kratos Ultra 2 in Japan) is a market leading X-ray photoelectron spectrometer combining state-of-the-art spectroscopic and imaging capabilities with the highest level of automation currently available.

Unrivalled large area spectroscopic performance allows photoelectron spectra to be acquired from all types of materials including metals, semi-conductors, and insulators.  Fast, high spatial resolution XPS imaging reveals the lateral distribution of surface chemistry and aids further characterisation with selected small area analysis.

The AXIS Supra+ is designed for flexibility allowing additional surface analysis and surface preparation options to be added without compromising XPS performance.  This makes it an invaluable tool for complete materials surface characterisation.

Sensitivity 

The AXIS Supra+ provides excellent sensitivity in spectroscopy and XPS imaging modes.  As with any form of spectroscopic technique, sensitivity is important in allowing collection of data in as short a time as possible.  Short acquisition times are particularly desirable for materials that are sensitive to X-ray exposure.  High sensitivity of the AXIS Supra+ also ensures easier collection of data from low concentration species and light elements with low photoelectron cross-sections.

  • Ability to detect, measure and quantify lowest concentrations
  • Faster acquisition times

Parallel XPS imaging

The lateral distribution of elements or chemistry at the surface is measured by XPS imaging.  The AXIS Supra+ acquires fast, high spatial resolution parallel images.  Parallel image acquisition has the advantage that it is significantly faster and achieves higher spatial resolution than the more conventional rastered beam approach.  Parallel imaging may also be combined with stage movements to acquire a ‘stitched’ image, capable of generating images over several millimetres with spatial resolution of several microns.

Capabilities provided by parallel imaging include:

  • Ultimate spatial resolution of 1 micron at the highest magnification.
  • High energy resolution, chemical state imaging.
  • Quantitative imaging – the unique spherical mirror analyser and delay-line detector can provide quantitative chemical state images.
  • Spectromicroscopy – easy acquisition of spectra from image datasets providing a spectrum at each pixel.

For further information about its features, visit Shimadzu official website.

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